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Synthesis of alicyclic polymers and characterization of chemical amplified positive photoresists having the same
Author(s) -
Liu JuiHsiang,
Hsieh ChingDong,
Tseng ChunChieh
Publication year - 2005
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.21324
Subject(s) - alicyclic compound , photoresist , polymer , materials science , methacrylate , polymer chemistry , methacrylic acid , copolymer , glass transition , methyl methacrylate , characterization (materials science) , polymer science , composite material , nanotechnology , layer (electronics)
To investigate the effects of cyclic structures of polymers on the physical properties of photoresist, a series of copolymers consisting of various comonomers selected from 3,6‐endo,oxo‐1,2,3,6‐tetrahydrophthalic anhydride (THPA), bornyl methacrylate (BMA), methacrylic acid (MA), t ‐butyl methacrylate ( t ‐BMA), and 2‐norborene (NB) was synthesized. The molecular weight, glass transition temperature, and the components of the synthesized copolymers were estimated. Photoresists consisting of the synthesized polymers and photoacid generator were prepared. The dependence of the molecular structures on the developers was investigated. The exposure characteristic curves of the photoresists were studied. The existence of the alicyclic comonomers was clearly found to increase the plasma resistance of the photoresist. The sensitivity, contrast, and exposed real image of the prepared photoresists were all investigated. The results obtained suggest that the alicyclic polymers synthesized in this investigation could be used as positive tone photoresists. © 2005 Wiley Periodicals, Inc. J Appl Polym Sci 96: 1505–1514, 2005