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Photolysis of poly(benzyl methacrylate)s and poly(benzyl acrylate)s in solution and films
Author(s) -
Itoh Yoshihiro,
Goshima Toshiyuki,
Shirai Hirofusa
Publication year - 2001
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.2070
Subject(s) - gel permeation chromatography , polymer chemistry , methacrylate , acrylate , bond cleavage , copolymer , polymer , monomer , radical , alkyl , polymerization , materials science , chemistry , organic chemistry , catalysis
Methacrylate and acrylate copolymers containing benzyl or 1‐phenylethyl groups and their monomeric model compounds were irradiated with a 254‐nm light in CH 2 Cl 2 and solid films. Low molecular weight and polymeric products were analyzed by gas chromatography (GC) and NMR spectroscopy, respectively, and main‐chain scission efficiencies were determined by gel permeation chromatography (GPC). The results indicate that the ester bond cleavage in the side chain produces alkyl radicals in the main chain, leading to main‐chain scission and crosslinking. The higher stability of tertiary alkyl radicals formed in methacrylate polymers lead to the predominant main‐chain scission in solution. On the other hand, acrylate polymers were less susceptible to photodegradation. The degradabilities of the polymer films reflected those of the polymer solutions, although crosslinking preferentially occurred. The distinct effect of oxygen on the degradation was also observed in solution and films. © 2001 John Wiley & Sons, Inc. J Appl Polym Sci 82: 2227–2236, 2001