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A new approach for selective surface modification of fluoropolymers by remote plasmas
Author(s) -
Park Y. W.,
Inagaki N.
Publication year - 2004
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.20553
Subject(s) - etfe , x ray photoelectron spectroscopy , tetrafluoroethylene , contact angle , surface modification , fluorine , materials science , fluoropolymer , remote plasma , polymer , chemical engineering , polymer chemistry , hydrogen , plasma , chemistry , composite material , nanotechnology , organic chemistry , copolymer , physics , metallurgy , chemical vapor deposition , layer (electronics) , quantum mechanics , engineering
Ethylene‐ co ‐tetrafluoroethylene (ETFE) and poly (vinylidene fluoride) (PVDF) films were exposed to the remote Ar, H 2 , and O 2 plasmas. The modified polymer surfaces were characterized by X‐ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and contact angle measurement. The plasma exposure led to weight loss and changes in the chemical composition on the polymer surface. Selective surface modification of fluoropolymers introduces various functional groups without altering the bulk properties. The results may be summarized as follows: the remote hydrogen plasma was the most effective in alternation from CF to CH (abstraction of fluorine). On the other hand, the remote oxygen plasma was unfavorable to abstract fluorine atoms, but effective in dehydrogenation (abstraction of hydrogen). © 2004 Wiley Periodicals, Inc. J Appl Polym Sci 93: 1012–1020, 2004