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Ion beam irradiation effect on gas permeation properties of polyimide films
Author(s) -
Xu X. L.,
Dolveck J. Y.,
Boiteux G.,
Escoubes M.,
Monchanin M.,
Dupin J. P.,
Davenas J.
Publication year - 1995
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1995.070550110
Subject(s) - polyimide , permeation , irradiation , membrane , materials science , ion , microstructure , permeability (electromagnetism) , ion implantation , ion beam , analytical chemistry (journal) , polymer chemistry , chemical engineering , nuclear chemistry , chemistry , composite material , chromatography , organic chemistry , nuclear physics , physics , engineering , biochemistry , layer (electronics)
This study deals with the ion beam irradiation effect on gas permeation properties of polyimide films. 2 MeV α, 500 keV, and 170 keV N + ions were used for modifying the membranes. It was found that there are two different effects according to the implantation dose. In the case of small‐dose irradiation, ion implantation causes a raise of permeability both for CH 4 and H 2 . When the implantation dose reaches a more important level, the implanted membranes have at the same time high permselectivity for H 2 /CH 4 and high permeability for H 2 . The relationships between the permeation properties and microstructure of the films are also discussed. © 1995 John Wiley & Sons, Inc.