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Structure of toluene sulfonamide formal resins: Molecular models from mechanistic schemes and analytical results
Author(s) -
Chiva V.,
Lecacheur M.,
Faure R.,
Gallo R.,
Wimmer E.
Publication year - 1993
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1993.070490310
Subject(s) - sulfonamide , toluene , formaldehyde , elemental analysis , proton nmr , chemistry , polymer chemistry , organic chemistry , computational chemistry , materials science
Toluene Sulfonamide Formaldehyde Resins (TSFR), having elemental analysis close to (C 8 H 9 NSO 2 ) n , are shown by GPC to exist as a mixture of a few (5 to 6) oligomers, having masses between 400 and 1900 g. A complete scheme of all the possible intermediates involved in their preparation is derived from the results of synthesis and from mechanistic steps; this allows one to propose the structure of oligomers having end groups OH and NH. IR, 1 H NMR, and 13 C NMR data on oligomers, compared to those of authentic samples specially designed and prepared, agree with the structures proposed. These results are helpful in designing modified or new resins to be used in nail lacquers. © 1993 John Wiley & Sons, Inc.