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Photosensitive polyimides developable with basic aqueous solutions (II)
Author(s) -
Takano Kei,
Mikogami Yukihiro,
Nakano Yoshihiro,
Hayase Rumiko,
Hayase Shuzi
Publication year - 1992
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1992.070460702
Subject(s) - aqueous solution , sulfonate , polymer chemistry , materials science , chemistry , polymer science , organic chemistry , sodium
Positive and negative photosensitive polyimides developable with basic aqueous solutions are reported. The results consist of poly amic acids and naphthoquinone diazides in which sulfonate groups have to be substituted at 4‐position. It depends on the naphthoquinone structures whether positive or negative patterns are obtained. In order to fabricate resist patterns, High‐Temperature‐Post‐Exposure‐Process (HIT‐PEB) must be utilized. The reaction mechanisms are also discussed. © 1992 John Wiley & Sons, Inc.