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Study on organosilicon positive resist. I. Syntheses and characterization of silsesquioxane, siloxane, and silmethylene polymers with phenolic hydroxy groups
Author(s) -
Sugiyama Hisashi,
Inoue Takashi,
Nate Kazuo
Publication year - 1992
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1992.070440909
Subject(s) - organosilicon , silsesquioxane , siloxane , polymer , trimethylsilyl , polymer chemistry , materials science , polymerization , organic chemistry , chemistry
Silsesquioxane, siloxane, and silmethylene polymers with phenolic hydroxy groups were prepared in order to obtain alkali‐soluble organosilicon polymers. These polymers have structures in which the phenol moieties are separated by one carbon from the silicon. The hydroxy groups were protected as methoxy groups in polymerization processes, then were changed into hydroxy groups by a reaction with trimethylsilyl iodide followed by alcoholysis. In the course of discussion on the characteristics of these polymers, silsesquioxane with phenolic hydroxy groups is found to possess excellent properties for matrix resins of alkalidevelopable organosilicon resists, such as O 2 RIE resistance and heat resistance.