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A study using 13 C CP/MAS NMR of microstructural changes in acrylate copolymers due to photolytic/SO 2 degradation
Author(s) -
Schadt R. J.,
Gilbert R. D.,
Fornes R. E.
Publication year - 1991
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1991.070430310
Subject(s) - copolymer , acrylate , vinyl chloride , photodegradation , polymer chemistry , methacrylate , vinyl acetate , methyl methacrylate , materials science , carbon 13 nmr , degradation (telecommunications) , glass transition , proton nmr , methyl acrylate , butyl acrylate , chemistry , catalysis , polymer , organic chemistry , composite material , telecommunications , photocatalysis , computer science
Photolytic degradation (350 nm) of acrylate‐type copolymer films in the presence of SO 2 and H 2 O has been examined using 13 C CP/MAS NMR. Copolymers in this study are used as binders in the paint and adhesives industry. The compositions contain butyl acrylate, vinyl acetate, vinyl chloride, and methyl methacrylate units in various combinations. Elemental analyses of the samples allow comparisons and confirmations of structural changes observed in the NMR spectra. A significant result is identification of pendant sulfate group incorporation in UV/SO 2 /or UV/SO 2 /H 2 O‐exposed VAc/BA‐type copolymers which has been attributed to a co‐unit interaction between BA and VAc units. It is suggested that effects on T g , the glass transition temperature, may account in part for this co‐unit effect on photodegradation.