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Removal and recovery of gallium and indium lons in acidic solution with chelating resin containing aminomethylphosphonic acid groups
Author(s) -
Maeda Hironori,
Egawa Hiroaki
Publication year - 1991
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1991.070420317
Subject(s) - gallium , aminomethylphosphonic acid , indium , sulfuric acid , inorganic chemistry , chemistry , chelation , hydrochloric acid , sodium hydroxide , adsorption , elution , nuclear chemistry , chromatography , organic chemistry , metabolite , biochemistry
Removal and recovery of gallium and indium ions in acidic solution with the macroreticular chelating resin containing aminomethylphosphonic acid groups was investigated. The resin (RMT‐P) exhibited high affinity for gallium and indium ions in sulfuric acid solution. In the column method, gallium and indium ions in sulfuric acid solution (0.05 or 0.5 mol/dm 3 ) were favorably adsorbed on the RMT‐P when the solution containing 27.6 mg/dm 3 of gallium ion or 51.4 mg/dm 3 of indium ion was passed through the RMT‐P column at a space velocity of 15 h −1 . The gallium and indium ions adsorbed were eluted by allowing 1 mol/dm 3 sodium hydroxide or 4 mol/dm 3 hydrochloric acid to pass through the column. The proposed resin appears to be useful for the recovery of gallium and indium ions in sulfuric acid solution.