Premium
Structure and ESR investigation of plasma‐polymerized film of hexafluoropropene
Author(s) -
Wang Daike,
Chen Jie
Publication year - 1991
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1991.070420128
Subject(s) - radical , polymerization , nitrogen , plasma , chemistry , branching (polymer chemistry) , analytical chemistry (journal) , polymer chemistry , materials science , organic chemistry , polymer , physics , quantum mechanics
The structure and constitution of plasma‐polymerized film of C 3 F 6 (PPHFP) have been investigated by measuring its ESCA, 19 F‐NMR, and IR spectra. It is found that the PPHFP film was a high degree of branching and 57% of quaternary carbons are linked to CF 3 groups. It is also found that the constitution of PPHFP film is changed greatly at high power and a large amount of Si and O atoms are linked to the PPHFP chains. Furthermore, using element analysis, ESCA, and theoretical calculation by electronegative model, we found that the nitrogen atoms get into the PPHFP chains when using N 2 as plasma gas. Besides, the radical concentration in the film is obtained to be 9.97 × 10 19 spins/g and its half‐life is about half a year at room temperature in Ar gas. Having investigated decay process of the radicals in two gases of air and Ar, we calculated the activation energies and rate constants of radical recombination and oxidation reactions at different temperatures.