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Kinetic effects on the impurities in epoxy‐resin/ m ‐xylylenediamine reaction
Author(s) -
Abuín Senén Paz,
Pellín Mercedes Pazos,
Núñez Lisardo
Publication year - 1990
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1990.070410920
Subject(s) - epoxy , differential scanning calorimetry , curing (chemistry) , impurity , materials science , infrared spectroscopy , amine gas treating , autocatalysis , kinetics , fourier transform infrared spectroscopy , scanning electron microscope , order of reaction , polymer chemistry , chemical engineering , nuclear chemistry , chemistry , composite material , organic chemistry , catalysis , reaction rate constant , thermodynamics , physics , quantum mechanics , engineering
Different isolated or competitive mechanisms have been experimentally observed in order to predict the kinetics of an epoxy—amine reaction in terms of various mathematical models based on different possibilities of reaction. Impurities such as water, glycols, and in general all donors of active hydrogen even at low concentrations significantly change the course of the reaction. We therefore decided to study the curing reaction of the epoxy resin, first as a commercial product and later purified, with m ‐xylylenediamine of known purity. The extent of cure has been followed and determined by differential scanning calorimetry (DSC) and infrared spectroscopy (FT‐IR). Purity, epoxy content and OH content were measured by liquid chromatography HPLC and wet analysis.