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Properties of positive resists. III. The dissolution behavior of poly(methyl methacrylate‐co‐maleic anhydride)
Author(s) -
Drummond Rashmi K.,
Boydston Gail L.,
Peppas Nikolaos A.
Publication year - 1990
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1990.070391107
Subject(s) - dissolution , methyl methacrylate , swelling , copolymer , resist , materials science , maleic anhydride , solubility , polymer chemistry , chemical engineering , nuclear chemistry , chemistry , layer (electronics) , composite material , organic chemistry , polymer , engineering
The dissolution characteristics of model positive resists were investigated through the use of various copolymers of methyl methacrylate and maleic anhydride. Dissolution in methyl ethyl ketone was found to be dependent on the radiation dose and on the composition of the copolymers. The Lee–Peppas dissolution model was used to calculate important parameters of this dissolution process. It was shown that the overall dissolution rate was initially controlled by the swelling process whereas the true disentanglement/dissolution process predominated during the latter portion of the overall phenomenon. In addition, the thickness of the formed gel layer was a function of the square root of time.