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Analysis of radiation chemical yields of chlorinated polystyrene derivatives
Author(s) -
Hartney Mark A.
Publication year - 1989
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1989.070370309
Subject(s) - resist , polystyrene , lithography , styrene , materials science , polymer , chlorine , electron beam lithography , irradiation , radiation , polymer chemistry , nanotechnology , copolymer , chemical engineering , optics , composite material , optoelectronics , physics , layer (electronics) , nuclear physics , metallurgy , engineering
A technique for determining radiation chemical yields from lithographic exposure curves for crosslinking type negative electron beam resists has been extended to include polymers with a general Poisson distribution. The technique is applied to several different chlorine‐containing styrene‐based resists. The radiation yields show good agreement with the differences in lithographic sensitivity and are explained by recent mechanistic studies. Optimal synthetic approaches for preparing this type of resist are described.