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Measuring and modelling the transition layer during the dissolution of glassy polymer films
Author(s) -
Krasicky P. D.,
Groele R. J.,
Rodriguez F.
Publication year - 1988
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1988.070350307
Subject(s) - dissolution , polymer , microelectronics , materials science , layer (electronics) , glass transition , thin film , swelling , solvent , methyl methacrylate , laser , chemical engineering , composite material , analytical chemistry (journal) , optics , nanotechnology , copolymer , chemistry , organic chemistry , physics , engineering
The technique of laser interferometry is now used routinely by the microelectronics industry for the measurement of the dissolution rates of thin polymer films. In addition to the rate of dissolution, laser interferometry can also provide quantitative information on the thickness of the transition layer between the dissolving glassy polymer and the liquid solvent. This paper describes how observed patterns of reflected light intensity may be analyzed to calculate the thickness of the transition layer for polymers that dissolve with little or no swelling. The technique requires knowledge of the shape of the concentration profile in the transition layer. However, by assuming various simple model profiles one may obtain a reasonable estimate. Experimental measurements of poly(methyl methacrylate) (PMMA) films dissolving in methylethyl ketone indicate transition layers of thicknesses 0 to 0.1 μm for PMMA of molecular weights M w = 37,000 to 1,400,000.