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Photochemistry of polymeric systems VII. Photo‐cross‐linking of liquid polysiloxanes including cinnamic groups
Author(s) -
Lemaitre Etienne,
Coqueret Xavier,
Mercier Régis,
LablacheCombier Alain,
Loucheux Claude
Publication year - 1987
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1987.070330628
Subject(s) - hydrosilylation , photoresist , moiety , copolymer , photosensitivity , polymer chemistry , polydimethylsiloxane , silane , materials science , cinnamic acid , photochemistry , siloxane , chemistry , polymer , organic chemistry , layer (electronics) , catalysis , optoelectronics
Cinnamoyloxymethyl dimethyl vinyl silane was synthesized and bound to a series of commercial polydimethylsiloxane‐type copolymers bearing variable amounts of SiH functions through a hydrosilylation reaction. This reaction was controlled in order to avoid side reactions between the photosensitive unsaturated moiety and the SiH groups. The photosensitivity of polymeric films was studied by a photoresist test described in previous papers. The results emphasize the role of the molecular weight of the starting copolymer and the percentage of pendant photosensitive groups.