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Dielectric and optical properties of nitrogen‐incorporated polyethylene films fabricated by plasma polymerization
Author(s) -
Kim S. H.,
Xie H. K.,
Kao K. C.
Publication year - 1986
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1986.070320622
Subject(s) - polyethylene , materials science , dielectric , nitrogen , polymerization , refractive index , plasma polymerization , molar absorptivity , polyethylene terephthalate , dissipation factor , analytical chemistry (journal) , conductivity , glow discharge , plasma , composite material , polymer , chemistry , organic chemistry , optics , optoelectronics , physics , quantum mechanics
The dielectric and optical properties of nitrogen‐incorporated polyethylene films fabricated by radio‐frequency glow discharge in ethylene‐nitrogen (C 2 H 4 − N 2 ) gas mixtures have been measured for various nitrogen concentrations. The results show that the plasma‐polymerized films have distinct properties from the ones based on conventional chemical polymerization. The incorporation of nitrogen in polyethylene results in an increase in breakdown strength, dissipation factor, and dielectric constant at frequencies below the optical frequency range, and in a decrease in dark conductivity, and in photoconductivity and extinction coefficient in the optical frequency range. However, the incorporation of nitrogen does not cause significant change in refractive index. The effects of the incorporation of nitrogen in polyethylene are attributed to the shallow acceptor‐like traps introduced by incorporated nitrogen.