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Plasma polymerization of organosilicon compounds
Author(s) -
Inagaki N.,
Kondo S.,
Hirata M.,
Urushibata H.
Publication year - 1985
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1985.070300821
Subject(s) - organosilicon , polymer , polymerization , chemical composition , infrared spectroscopy , hydrogen , sulfur , silicon , plasma polymerization , plasma , elemental analysis , polymer chemistry , chemical structure , chemistry , carbon fibers , infrared , materials science , organic chemistry , composite number , physics , quantum mechanics , optics , composite material
Plasma polymerizations in five silicon compounds having chemical formula of (CH 3 ) 3 SiXSi(CH 3 ) 3 , X = none, CH 2 , NH, O, and S atoms, were investigated by elemental analysis, infrared spectroscopy, and ESCA. The chemical composition of polymers plasma‐polymerized was influenced by the X groups in (CH 3 ) 3 SiXSi(CH 3 ) 3 . Polymers, when X was S atoms, possessed no sulfur; and X was CH 2 groups polymers rich in carbon and hydrogen atoms were formed. Details in chemical composition were discussed by IR and ESCA. Such differences in chemical composition reflected on gas permeability of the plasma films.