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Preparation of siloxane‐like films by glow discharge polymerization
Author(s) -
Inagaki N.,
Kondo S.,
Murakami T.
Publication year - 1984
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1984.070291133
Subject(s) - hexamethyldisiloxane , siloxane , tetramethylsilane , polymer , polymerization , polydimethylsiloxane , materials science , glow discharge , polymer chemistry , plasma polymerization , monomer , octamethylcyclotetrasiloxane , chemical engineering , disiloxane , analytical chemistry (journal) , chemistry , organic chemistry , composite material , catalysis , physics , plasma , quantum mechanics , engineering
Glow discharge polymerizations of tetramethoxysilane (TMOS), tetramethylsilane/oxygen mixture (½ molar ratio) (TMS/O 2 ), hexamethyldisiloxane (HMDSO), and tetramethyldisiloxane (TMDSO) were carried out for the preparation of thin, polymeric films with siloxane structures. The chemical composition of the formed polymers was examined by elemental analysis, infrared spectroscopy, and electron spectroscopy for chemical analysis (ESCA) in connection with polymerization conditions, especially, a level of the radiofrequency (rf) input power per mass of the monomers ( W / FM value). The polymers prepared from HMDSO at fairly low W / FM values resembled in chemical composition the conventionally polymerized polydimethylsiloxane. The surface properties of the formed polymers also were evaluated by the measurement of surface energy.