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Photochemistry of polymeric systems. VI. Photocrosslinking of basic polymers and copolymers dyeing
Author(s) -
M'Bon Gaston,
Roucoux Colette,
LablacheCombier A.,
Loucheux C.
Publication year - 1984
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1984.070290221
Subject(s) - copolymer , polymer chemistry , polymer , photosensitivity , materials science , thioxanthone , dyeing , photoresist , chemistry , photoinitiator , monomer , composite material , optoelectronics , layer (electronics)
Poly( N ‐vinylamine) (PVAm) and methylmethacrylate/dimethylaminoethylmethacrylate copolymers (MMA/DMAEMA) were prepared and then substituted by cinnamic or cinnamylidene photosensitive groups. The photosensitivity of these materials was determined using the so‐called photoresist test in various experimental conditions. A comparison was made between MMA/DMAEMA and methylmethacrylate/4‐vinylpyridine (MMA/4VP) photosensitized copolymers. The best results were obtained with MMA/DMAEMA on textile support. A photosensitization study was carried out by adding some compounds such as thioxanthone (10% in bulk). It showed that the multiplicity factor can be 10 with MMA/DMAEMA copolymers and even up to 64 for photosensitive PVAm. The addition of anionic dyes on the polymers emphasized that a better fixation occured for aliphatic amines than for pyridinic ones.