Photochemistry of polymeric systems. VI. Photocrosslinking of basic polymers and copolymers dyeing | Zendy

M'Bon Gaston | Zendy; Roucoux Colette | Zendy; LablacheCombier A. | Zendy; Loucheux C. | Zendy

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Photochemistry of polymeric systems. VI. Photocrosslinking of basic polymers and copolymers dyeing

Author(s) -

M'Bon Gaston,

Roucoux Colette,

LablacheCombier A.,

Loucheux C.

Publication year - 1984

Publication title -

journal of applied polymer science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.575

H-Index - 166

eISSN - 1097-4628

pISSN - 0021-8995

DOI - 10.1002/app.1984.070290221

Subject(s) - copolymer , polymer chemistry , polymer , photosensitivity , materials science , thioxanthone , dyeing , photoresist , chemistry , photoinitiator , monomer , composite material , optoelectronics , layer (electronics)

Poly( N ‐vinylamine) (PVAm) and methylmethacrylate/dimethylaminoethylmethacrylate copolymers (MMA/DMAEMA) were prepared and then substituted by cinnamic or cinnamylidene photosensitive groups. The photosensitivity of these materials was determined using the so‐called photoresist test in various experimental conditions. A comparison was made between MMA/DMAEMA and methylmethacrylate/4‐vinylpyridine (MMA/4VP) photosensitized copolymers. The best results were obtained with MMA/DMAEMA on textile support. A photosensitization study was carried out by adding some compounds such as thioxanthone (10% in bulk). It showed that the multiplicity factor can be 10 with MMA/DMAEMA copolymers and even up to 64 for photosensitive PVAm. The addition of anionic dyes on the polymers emphasized that a better fixation occured for aliphatic amines than for pyridinic ones.

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