Premium
Relationship between electron sensitivity and chemical structures of polymers as EB resists. II. Acetalized polyvinyl alcohol as new negative EB resists
Author(s) -
Ogata Naoya,
Sanui Kohei,
Oguchi Kiyoshi,
Nakada Tomihiro,
Takahashi Yoichi
Publication year - 1983
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1983.070280726
Subject(s) - electron micrographs , resist , chemical technology , polyvinyl alcohol , polymer science , chemistry , nanotechnology , materials science , engineering , physics , organic chemistry , manufacturing engineering , layer (electronics) , electron microscope , optics
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom