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Photopolymerization using sensitizers of binary system of aromatic hydrocarbon and amine
Author(s) -
Kubota Hitoshi,
Ogiwara Yoshitaka
Publication year - 1983
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1983.070280725
Subject(s) - photopolymer , triethylamine , naphthalene , anthracene , acrylonitrile , tertiary amine , phenanthrene , photochemistry , chemistry , monomer , polymerization , aromatic hydrocarbon , amine gas treating , polymer chemistry , organic chemistry , hydrocarbon , copolymer , polymer
Photopolymerizations of acrylonitrile and methyl methacrylate, using binary sensitizers of aromatic hydrocarbon and amine, were investigated at 30°C in N , N ‐dimethylformamide under the irradiation with a light of λ > 300 nm. Naphthalene, anthracene, and phenanthrene were employed as aromatic hydrocarbons in the experiment. The binary system was effective for the initiation of the monomers. The combinations of naphthalene with tertiary amines, triethylamine and N , N ‐dimethylaniline, were remarkably effective among various combinations. The rate of polymerization with naphthalene–triethylamine sensitizer was observed to be proportional to the first, ½, and ½ powers of monomer, naphthalene, and triethylamine concentrations, respectively. The kinetics of the photopolymerization are proposed, and the initiation schemes are discussed, comparing them with those in the system sensitized by aromatic ketone–amine reported previously.