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Syntheses of photocrosslinkable polymer from modified poly(methyl vinyl ketone)
Author(s) -
Kinoshita Akihiro,
Namariyama Yoichi
Publication year - 1983
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1983.070280329
Subject(s) - polymer , materials science , polymer chemistry , photosensitivity , polymerization , methyl vinyl ketone , vinyl chloride , vinyl alcohol , addition polymer , photopolymer , photochemistry , copolymer , chemistry , organic chemistry , composite material , catalysis , optoelectronics
Photocrosslinkable polymer is prepared from amorphous poly(methyl vinyl ketone) (A‐PMVK) obtained by anionic polymerization of methyl vinyl ketone. The reaction of A‐PMVK with cinnamoyl chloride proceeds in pyridine at 50°C. The photosensitivity of the polymer obtained is measured by infrared and Ultraviolet photometry. The polymer is of a crosslinkable type and forms cyclobutane linkage by ultraviolet irradiation. The polymer is coated on a lithographic aluminum plate and exposed to arc and high‐pressure mercury lamps. Development is with benzene, and standard inking by lithography is applied. The imaging area on the plate is stable and harder than poly(vinyl cinnamate), due to intra‐ and intermolecular cyclization of the main chain. Many good reproductions are produced in the lithographic proofing machine. The photosensitive polymer obtained by A‐PMVK is very useful in relief plates requiring etching.