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Functionalized allyl resins. I. Photosensitivity of partially cinnamoylated allyl resins
Author(s) -
Matsumoto Akira,
Fukazawa Akeru,
Oiwa Masayoshi
Publication year - 1983
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1983.070280102
Subject(s) - photosensitivity , yield (engineering) , polymer chemistry , chemistry , irradiation , materials science , organic chemistry , composite material , optoelectronics , nuclear physics , physics
The preparation of photosensitive allyl resins is described. The introduction of cinnamoyl groups into allyl resins is attempted for imparting successfully photosensitive functionality. Thus, the photosensitivity of cinnamoylated poly(allyl benzoate) was first examined in detail as a model photoreaction of cinnamoylated allyl resins. Cinnamoylated poly(diallyl phthalate) was then UV‐irradiated to yield crosslinked resin, and its photosensitivity was compared with that of other allyl resins. The highest photosensitivity was observed for cinnamoylated poly(diallyl phthalate), although the mobility of the main polymer chain was considered to be lowest; this may be ascribed to the function of phthaloyl groups as photosensitizers.