Photochemistry of polymeric systems. IV. Photocrosslinking of copolymers including pyridinium dicyanomethylide groups | Zendy

Cottart Jean;Jacques | Zendy; Loucheux Claude | Zendy; Lablache;Combier Alain | Zendy

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Photochemistry of polymeric systems. IV. Photocrosslinking of copolymers including pyridinium dicyanomethylide groups

Author(s) -

Cottart Jean;Jacques,

Loucheux Claude,

Lablache;Combier Alain

Publication year - 1981

Publication title -

journal of applied polymer science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.575

H-Index - 166

eISSN - 1097-4628

pISSN - 0021-8995

DOI - 10.1002/app.1981.070260415

Subject(s) - copolymer , photosensitivity , tetracyanoethylene , polymer chemistry , photochemistry , materials science , photoresist , polymer , pyridinium , pyridine , styrene , photopolymer , ketone , chemistry , monomer , organic chemistry , nanotechnology , optoelectronics , layer (electronics) , composite material

Photocrosslinkable polymers were obtained by reacting tetracyanoethylene oxide with pyridine units of suitable copolymer. Copolymers of styrene and 4‐;vinylpyridine dicyanomethylide were synthetized and studied. The methods used for characterization of photocrosslinked films were a “photoresist test” or the measurement of the insolubilization ratio. The reaction is favored by triplet‐;state sensitizers such as Michler's ketone. The photosensitivity of the copolymers was determined as a function of the wavelength of the radiation used.

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