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Photochemistry of polymeric systems. IV. Photocrosslinking of copolymers including pyridinium dicyanomethylide groups
Author(s) -
Cottart Jean;Jacques,
Loucheux Claude,
Lablache;Combier Alain
Publication year - 1981
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1981.070260415
Subject(s) - copolymer , photosensitivity , tetracyanoethylene , polymer chemistry , photochemistry , materials science , photoresist , polymer , pyridinium , pyridine , styrene , photopolymer , ketone , chemistry , monomer , organic chemistry , nanotechnology , optoelectronics , layer (electronics) , composite material
Abstract Photocrosslinkable polymers were obtained by reacting tetracyanoethylene oxide with pyridine units of suitable copolymer. Copolymers of styrene and 4‐;vinylpyridine dicyanomethylide were synthetized and studied. The methods used for characterization of photocrosslinked films were a “photoresist test” or the measurement of the insolubilization ratio. The reaction is favored by triplet‐;state sensitizers such as Michler's ketone. The photosensitivity of the copolymers was determined as a function of the wavelength of the radiation used.