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Halogenated polyethylenes as electron‐sensitive resists
Author(s) -
Sikorski Ryszard T.,
Gabryś Ryszard
Publication year - 1980
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1980.070250615
Subject(s) - polyethylene , limiting , resist , materials science , cathode ray , irradiation , degradation (telecommunications) , electron , electron beam processing , layer (electronics) , polymer chemistry , chemical engineering , chemistry , composite material , physics , nuclear physics , mechanical engineering , telecommunications , computer science , engineering
Irradiation of a layer of halogenated polyethylene with an electron beam at 10‐kV accelerating potential brings about crosslinking of brominated and chlorobrominated polyethylenes, but the chlorinated polyethylenes undergo either crosslinking or degradation, depending on the electron charge delivered. The limiting charge value which separates these two effects was found to be ca. 1 × 10 −3 C/cm 2 . The minimum useful dose was found to increase in the order brominated, chlorobrominated, chlorinated polyethylene.