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Electron diffraction studies on Indian silk
Author(s) -
Bhat N. V.,
Nadiger G. S.,
Paralikar K. M.,
Betrabet S. M.
Publication year - 1980
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1980.070250410
Subject(s) - silk , diffraction , electron diffraction , materials science , selected area diffraction , electron , crystallography , optics , chemistry , composite material , physics , nuclear physics
The lateral order factor of four Indian varieties of silk, viz., Mulberry, Tasar, Eri, and Muga, were determined by electron diffraction technique and compared with that determined by x‐ray diffraction. The profiles of the 002 and 201 reflections in Mulberry were better resolved by the electron diffraction technique.

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