Plasma polymerization of tetrafluoroethylene

The plasma polymerization of C 2 F 4 was carried out in both continuous wave and pulsed rf discharges to establish the effects of reaction conditions on the kinetics of polymer deposition and the polymer structure. ESCA spectra of the polymer show evidence for CF 3 , CF 2 , and CH 2 groups. Under conditions favoring low deposition rates, the dominant functional group is CF 2 . At higher deposition rates the concentration of CF 2 groups is reduced and a more crosslinked polymer is produced. Both polymer deposition rates and polymer structures were essentially identical when using continuous wave and pulsed rf discharges.