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Plasma polymerization of tetrafluoroethylene
Author(s) -
Nakajima K.,
Bell A. T.,
Shen M.,
Millard M. M.
Publication year - 1979
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1979.070230908
Subject(s) - tetrafluoroethylene , polymer , deposition (geology) , polymerization , plasma polymerization , materials science , kinetics , plasma , polymer chemistry , analytical chemistry (journal) , chemical engineering , chemistry , organic chemistry , copolymer , composite material , paleontology , physics , quantum mechanics , sediment , engineering , biology
Abstract The plasma polymerization of C 2 F 4 was carried out in both continuous wave and pulsed rf discharges to establish the effects of reaction conditions on the kinetics of polymer deposition and the polymer structure. ESCA spectra of the polymer show evidence for CF 3 , CF 2 , and CH 2 groups. Under conditions favoring low deposition rates, the dominant functional group is CF 2 . At higher deposition rates the concentration of CF 2 groups is reduced and a more crosslinked polymer is produced. Both polymer deposition rates and polymer structures were essentially identical when using continuous wave and pulsed rf discharges.