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Electron‐sensitive resists. II. Positive resists derived from high polymers of methyl methacrylate, methyl α‐chloroacrylate, and hexyl methacrylate
Author(s) -
Lai Juey H.,
Shrawagi Suresh
Publication year - 1978
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1978.070220105
Subject(s) - resist , methyl methacrylate , methacrylate , copolymer , polymer chemistry , polymer , materials science , poly(methyl methacrylate) , composite material , layer (electronics)
This paper reports the synthesis, characterization, and evaluation of copolymers of methyl methacrylate (MMA) and hexyl methacrylate (HMA) and of HMA and methyl α‐chloroacrylate (MCA) and of terpolymers of MMA, MCA, and HMA as electron‐sensitive positive resists. The sensitivities of the resists were found to be strongly dependent on the composition. Two of the terpolymers were found to be significantly more sensitive than poly(methyl methacrylate) (PMMA).