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A study of the contact angle on RTV‐silicone treated in a hydrogen glow discharge
Author(s) -
Hudis Martin,
Prescott L. E.
Publication year - 1975
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1975.070190211
Subject(s) - contact angle , glow discharge , materials science , distilled water , hydrogen , irradiation , silicone , polymer , composite material , analytical chemistry (journal) , chemistry , plasma , organic chemistry , chromatography , physics , quantum mechanics , nuclear physics
A hydrogen glow discharge surface treatment followed by exposure to the atmosphere has been used to decrease the contact angle for distilled water on RTV‐silicone. The change in contact angle has been studied in terms of vacuum ultraviolet irradiation, metastable bombardment, free‐radical bombardment, and electrostatic charging. The study demonstrates that the decrease in the contact angle is caused by the interaction of the hydrogen atoms produced in the glow discharge with the polymer surface.