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Formation of fluorocarbon films by ultraviolet surface photopolymerization
Author(s) -
Millard M. M.
Publication year - 1974
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1974.070181103
Subject(s) - fluorocarbon , x ray photoelectron spectroscopy , photopolymer , materials science , contact angle , monomer , surface energy , ultraviolet , hydrocarbon , chemical engineering , analytical chemistry (journal) , polymer chemistry , polymer , chemistry , composite material , organic chemistry , optoelectronics , engineering
The formation of surface‐photopolymerized films from six fluorocarbon monomers in the gas phase at low pressure is described. Transparent, low surface‐energy films from 250 to 300 Å thick readily formed on glass microscope slides on exposure to an UV source in the presence of the monomer vapor. These films were characterized by water and hydrocarbon contact angles and by surface analysis by x‐ray photoelectron spectroscopy (XPS). Although these films strongly adhered to the surface under normal conditions, they could be removed by exposure to an oxygen plasma for a few minutes. Surface analysis by XPS revealed that the fluorocarbon was converted to fluoride ion by plasma treatment.