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Vapor pressure osmometry: A model accounting for the solute dependence of the calibration constant
Author(s) -
Bersted Bruce H.
Publication year - 1974
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1974.070180818
Subject(s) - osmometer , constant (computer programming) , vapor pressure osmometry , calibration , thermodynamics , vapor pressure , materials science , chemistry , physics , polymer chemistry , quantum mechanics , computer science , programming language
A model describing the operation of the vapor pressure osmometer has been developed to account for the solute dependence of the calibration constant. This model envisions the existence of a diffusion‐controlled surface concentration that differs from the concentration of the drop as a whole. Three limiting cases approximated for the surface concentration depend on the relative magnitudes of thermistor self‐heating and solution concentration. Quantitative predictions of the dependence of d (Δ R )/ d ( V 2 ) (the variation of thermistor resistance difference with thermistor self‐heating) on both solute molecular weight and solution concentration are in good agreement with experimental data.