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The mechanism of photoprotection of polystyrene film by some ultraviolet absorbers
Author(s) -
George G. A.
Publication year - 1974
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1974.070180110
Subject(s) - benzophenone , benzotriazole , photochemistry , polystyrene , phosphorescence , quenching (fluorescence) , ultraviolet , photoprotection , phototoxicity , materials science , chelation , nickel , substrate (aquarium) , excited state , polymer , chemistry , organic chemistry , optoelectronics , fluorescence , optics , biochemistry , physics , photosynthesis , oceanography , nuclear physics , in vitro , geology
The efficiency of three commercial ultraviolet absorbers, a 2‐hydroxy benzophenone, a 2‐hydroxy benzotriazole, and a nickel chelate, in preventing the photo‐oxidation of polystyrene films has been measured. When compared with the calculated screening and phosphorescence quenching efficiency, it is found that (i) the nickel chelate protects the substrate by UV screening alone and is a poor photoprotector, and (ii) the 2‐hydroxy benzophenone and 2‐hydroxy benzotriazole are more efficient photoprotectors and protect by triplet energy transfer from excited polymer carbonyl impurity groups in addition to UV screening.