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Electron irradiation of poly(olefin sulfones). Application to electron beam resists
Author(s) -
Bowden M. J.,
Thompson L. F.
Publication year - 1973
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1973.070171022
Subject(s) - depolymerization , resist , olefin fiber , chain scission , irradiation , polymer , electron beam processing , polymer chemistry , side chain , cathode ray , materials science , electron , molar mass distribution , chemistry , bond cleavage , analytical chemistry (journal) , organic chemistry , nanotechnology , physics , catalysis , layer (electronics) , quantum mechanics , nuclear physics
All the poly(olefin sulfones) examined degraded rapidly under electron irradiation. The dose required to effect a molecular weight distribution completely separated from the original distribution as required for fractional solution development was similar for all polymers, viz., 1–2 × 10 −6 coulomb/cm 2 . This indicates that they all have similar values for G (scission). The film thickness of the exposed area decreased at a rate dependent on olefin structure and temperature. This process, termed vapor development, has been attributed to concurrent chain scission and depolymerization. Factors determining the rate of depropagation are discussed.