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Photolysis of poly( p ‐methylstyrene)
Author(s) -
Weir N. A.
Publication year - 1973
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1973.070170207
Subject(s) - photodissociation , quantum yield , photochemistry , monomer , benzene , polystyrene , hydrogen atom abstraction , chemistry , solubility , hydrogen , yield (engineering) , irradiation , ring (chemistry) , polymer chemistry , materials science , polymer , organic chemistry , fluorescence , quantum mechanics , nuclear physics , metallurgy , physics
Poly( p ‐methylstyrene) films have been irradiated with 253.7‐nm radiation under high vacuum at 25°C. The main reaction product is hydrogen, but methane and traces of ethane and monomer were also detected. The quantum yield for H 2 production (6 × 10 ‐2 ) is considerably greater than that for polystyrene photolysis indicating that both α‐CH bonds undergo fission. Solubility measurements also indicated the participation by the p ‐methyl group. Main‐chain conjugation and coloration occur and are attributable to hydrogen abstraction from the β‐carbon atom. Cyclohexadienyl compounds are also formed and are presumably associated with crosslinking involving addition to the benzene ring. The mechanisms of photochemical and photophysical processes are discussed.