Premium
Dielectric behavior of sulfonic acid–polystyrene films
Author(s) -
Wallace Richard A.
Publication year - 1973
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1973.070170117
Subject(s) - polystyrene , sulfonic acid , dielectric , materials science , polymer chemistry , polarizability , polymer , dielectric loss , permittivity , chemical engineering , composite material , organic chemistry , chemistry , molecule , optoelectronics , engineering
The dielectric properties of partially sulfonated polystyrene films (15% degree of sulfonation) in their dry and slightly wet (4.7% by weight of water content) states were measured over the frequency range between 10 2 and 10 5 Hz with temperature as a parameter. Loosely crosslinked (1% divinyl benzene) polystyrene films were synthesized and sulfonated with chlorosulfonic acid to a 15% degree of sulfonation. Films containing more than 15% sulfonation were very brittle. Dielectric constant and loss data of these sulfonic acid films are presented at various temperatures and are correlated in terms of Cole‐Cole plots. The dielectric response characteristics of these films find application in the electroformation of sulfonated polymer electrets, which have been shown to possess a high degree of polarizability and are capable of storing large amounts of electric charge.