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Thin water vapor barriers for paper
Author(s) -
Liepins R.,
Kearney J.
Publication year - 1971
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1971.070150602
Subject(s) - silane , chlorine , water vapor , materials science , monomer , chemical vapor deposition , attenuated total reflection , infrared spectroscopy , thin film , chemical engineering , ultimate tensile strength , infrared , polymer , deposition (geology) , vapor pressure , composite material , organic chemistry , chemistry , nanotechnology , optics , metallurgy , sediment , engineering , biology , paleontology , physics
Low‐pressure plasma technique was used in the deposition of thin polymeric coatings upon a filter paper. Sixteen different monomers, including aromatic and aliphatic hydrocarbons, nitriles, chlorine‐containing compounds, and a silane, were used in the coatings. Most of the coatings functioned as water vapor barriers in different degrees, and the coated samples possessed wet tensile strengths anywhere from 3 to 34 times that of the untreated samples. Attenuated total reflectance infrared spectroscopy was used to study the chemical structure of the coatings.