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Photoreactive polymers. IV. The synthesis and characterization of photocrosslinkable polysulfonates
Author(s) -
Arcesi J. A.,
Rauner F. J.,
Williams J. L. R.
Publication year - 1971
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1971.070150301
Subject(s) - photoresist , condensation polymer , polymer , ketone , copolymer , polymer chemistry , characterization (materials science) , materials science , alkali metal , chemistry , organic chemistry , nanotechnology , layer (electronics)
A series of new light‐sensitive polysulfonate copolymers have been prepared by the interfacial polycondensation of mixed bisphenols and aromatic disulfonyl chlorides. The light‐sensitivity bisphenols contain the styryl ketone group. These polymers exhibit good light sensitivity, and upon exposure to light they crosslink and harden to give alkali‐ and acid‐resistant materials which are useful in photoresist applications.