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Photodegradative wavelength dependence of thermally resistant organic polymers
Author(s) -
Johnson L. D.,
Tincher W. C.,
Bach H. C.
Publication year - 1969
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1969.070130902
Subject(s) - polymer , materials science , polyamide , photodegradation , wavelength , benzene , ultraviolet , polyurethane , ultraviolet light , polymer chemistry , photochemistry , composite material , optoelectronics , chemistry , organic chemistry , photocatalysis , catalysis
The wavelength dependence of photodegradation of three “high temperature” aromatic polyamide polymers has been very accurately determined by means of a fast grating spectrograph used in conjunction with a high pressure xenon arc. One of these polymers, the poly‐(isophthalamide) of 4,4′‐bis( p ‐aminophenyl)‐2,2′bithiazole, was found to be degraded significantly by visible light, especially that of 4140 Å, wavelength. Both the poly‐terephthalamide of 1,3‐bis(3‐aminobenzamide) benzene and Du Pont Nomex, also an aromatic polyamide, were damaged primarily by radiation in the near ultraviolet region. Degradation band maxima for these polymers were observed at 3700 Å, and 3600 Å, respectively. All three thermally resistant polymers were thus found to be degraded by light of much longer wavelength than that which is harmful to other common polymers.