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Three‐component photoresists containing thermally crosslinkable vinyl ether derivatives
Author(s) -
Moon SeongYun
Publication year - 2001
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.1796
Subject(s) - vinyl ether , ether , monomer , polymer chemistry , polymer , photopolymer , aqueous solution , materials science , chemistry , organic chemistry , composite material
Poly(4‐hydroxystyrene‐ co ‐4‐methoxystyrene) (MEOST) was synthesized and MEOST‐13 with the methoxystyrene content of 12.5 mol % was used as a binder polymer for a three‐component photopolymer system. The MEOST‐13 films containing a vinyl ether monomer and a photoacid generator are insolubilized in an aqueous base in a prebake step owing to the thermal crosslinking reaction between hydroxyl groups of MEOST‐13 and vinyl ether groups. Upon exposure to light and subsequent postexposure bake, the crosslinks are decomposed by photogenerated acids, leading to effective solubilization of the exposed areas. The MEOST‐13 films showed sufficient insolubilization at baking temperatures of 140°C or above. The conversion of vinyl ether groups increased rapidly with increasing baking temperature. The sensitivity of the MEOST‐13 films increased abruptly with an increase in postexposure bake temperature because of the nature of chemical amplification. The MEOST‐13 films showed a sensitivity of 33 mJ/cm 2 and afforded positive‐tone images with the improved resolution of 0.30‐μm line and space at 248‐nm light. © 2001 John Wiley & Sons, Inc. J Appl Polym Sci 81: 3399–3404, 2001