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Preparation of hyperbranched polyester photoresists for miniaturized optics
Author(s) -
Feng Zongcai,
Liu Minghua,
Wang Yuechuan,
Zhao Lin
Publication year - 2004
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.13707
Subject(s) - resist , materials science , polymer , epichlorohydrin , polyester , polymer chemistry , fluoropolymer , etching (microfabrication) , composite material , chemical engineering , layer (electronics) , engineering
Hyperbranched polymers containing carboxyl and acryloxyl groups were prepared through a one‐step synthesis with metatrimellitic anhydride, epichlorohydrin, and methylacrylic acid glycidic ester. The photo‐sensitivity coefficients of the polymer resists varied with the resin acid values and formulas. The linear depth was the reverse of the contrast. When the contrast was less than 0.49, the linear depth could reach 43 μm. The hyperbranched polyester resists were used to prepare microlens arrays. Moreover, there was a slight discrepancy between the element profile and simulated profile of the formed resists. The etching depth could reach 50 μm. © 2004 Wiley Periodicals, Inc. J Appl Polym Sci 92: 1259–1263, 2004