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Properties of amine‐containing coatings prepared by plasma polymerization
Author(s) -
Choukourov A.,
Biederman H.,
Kholodkov I.,
Slavinska D.,
Trchova M.,
Hollander A.
Publication year - 2004
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.13387
Subject(s) - polymerization , derivatization , plasma polymerization , amine gas treating , monomer , ethylenediamine , polymer chemistry , fourier transform infrared spectroscopy , chemistry , chemical engineering , materials science , plasma , polymer , organic chemistry , high performance liquid chromatography , engineering , physics , quantum mechanics
Two monomers, ethylenediamine (EDA) and diaminocyclohexane (DACH), were plasma‐polymerized in continuous‐wave (CW) and pulse modes. The influence of different plasma parameters on the deposition rate and film composition were investigated in detail and the changes in aminofunctionalization with varying pulse parameters were examined by FTIR, ESCA, and chemical‐derivatization techniques. It was shown that a varying duty cycle does not produce a considerable effect on the retention of amine groups into the film, while power and t on play a significant role in the polymerization process. © 2004 Wiley Periodicals, Inc. J Appl Polym Sci 92: 979–990, 2004