Thermodynamics of surface self‐developing structure formation on polyamide films under ultraviolet irradiation | Zendy

Rebouillat Serge | Zendy; Lavielle Lisette | Zendy; Wilmet Sophie | Zendy

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Thermodynamics of surface self‐developing structure formation on polyamide films under ultraviolet irradiation

Author(s) -

Rebouillat Serge,

Lavielle Lisette,

Wilmet Sophie

Publication year - 2002

Publication title -

journal of applied polymer science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.575

H-Index - 166

eISSN - 1097-4628

pISSN - 0021-8995

DOI - 10.1002/app.10601

Subject(s) - polyamide , ultraviolet , solvent , irradiation , photoinitiator , materials science , copolymer , polymer chemistry , diffusion , ultraviolet irradiation , chemical engineering , polymer , chemistry , thermodynamics , composite material , organic chemistry , monomer , physics , optoelectronics , nuclear physics , engineering

Polyamide terpolymer films can be obtained by the evaporation of a solvent–terpolymer–photoinitiator mixture on a glass plate. Through ultraviolet (UV) irradiation, self‐developing properties are observed. The nuclear magnetic resonance (NMR) study of the photochemical reaction involved in such a process permits us to propose a mechanism with a diffusion of solvent in the irradiated areas. The thermodynamics of irreversible process have been applied to the analysis of such a system behavior, and an analysis of the stability of the system resulting from its residual solvent content has been made. © 2002 Wiley Periodicals, Inc. J Appl Polym Sci 85: 645–653, 2002

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