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Thermodynamics of surface self‐developing structure formation on polyamide films under ultraviolet irradiation
Author(s) -
Rebouillat Serge,
Lavielle Lisette,
Wilmet Sophie
Publication year - 2002
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.10601
Subject(s) - polyamide , ultraviolet , solvent , irradiation , photoinitiator , materials science , copolymer , polymer chemistry , diffusion , ultraviolet irradiation , chemical engineering , polymer , chemistry , thermodynamics , composite material , organic chemistry , monomer , physics , optoelectronics , nuclear physics , engineering
Polyamide terpolymer films can be obtained by the evaporation of a solvent–terpolymer–photoinitiator mixture on a glass plate. Through ultraviolet (UV) irradiation, self‐developing properties are observed. The nuclear magnetic resonance (NMR) study of the photochemical reaction involved in such a process permits us to propose a mechanism with a diffusion of solvent in the irradiated areas. The thermodynamics of irreversible process have been applied to the analysis of such a system behavior, and an analysis of the stability of the system resulting from its residual solvent content has been made. © 2002 Wiley Periodicals, Inc. J Appl Polym Sci 85: 645–653, 2002