Premium
Coloring of radiation damages in ion‐implanted poly(aryl ether ether ketone): LiCl uptake and thermal desorption
Author(s) -
Červená J.,
Vacík J.,
Hnatowicz V.,
Švorčík V.,
Kobayashi Y.
Publication year - 2002
Publication title -
journal of applied polymer science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.575
H-Index - 166
eISSN - 1097-4628
pISSN - 0021-8995
DOI - 10.1002/app.10253
Subject(s) - peek , ether , aryl , desorption , dopant , annealing (glass) , aqueous solution , irradiation , ion , ketone , nuclear chemistry , materials science , polymer chemistry , chemistry , analytical chemistry (journal) , organic chemistry , doping , polymer , alkyl , physics , optoelectronics , adsorption , nuclear physics , composite material
Abstract Poly(aryl ether ether ketone) (PEEK) films irradiated with 2 MeV O + and Ar + ions to fluences in the range 10 11 –10 13 cm −2 were treated with 5 mol/L LiCl aqueous solution at 100°C for 1 h. After removal of excessive, weakly bound LiCl the samples were annealed at temperatures from 50 to 250°C for 1 h to check the mobility of the incorporated LiCl. The amount of incorporated LiCl and its depth profile were determined using the neutron depth‐profiling (NDP) technique, which makes use of the 6 Li( n th , 4 He) 3 H nuclear reaction. Up to the maximum annealing temperature no significant escape of the LiCl was observed. With increasing annealing temperature, a gradual migration of LiCl dopant toward the sample surface was observed on the irradiated PEEK samples. © 2002 Wiley Periodicals, Inc. J Appl Polym Sci 83: 2780–2784, 2002; DOI 10.1002/app.10253