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Effect of substrate on the morphology, crystal structure and property of ZnO thin films
Author(s) -
Chen Ruiqun,
Li Zhengwei,
Gao Wei
Publication year - 2007
Publication title -
asia‐pacific journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.348
H-Index - 35
eISSN - 1932-2143
pISSN - 1932-2135
DOI - 10.1002/apj.70
Subject(s) - materials science , substrate (aquarium) , x ray photoelectron spectroscopy , thin film , morphology (biology) , non blocking i/o , sputtering , sputter deposition , composite material , chemical engineering , conductivity , porosity , nanotechnology , chemistry , catalysis , biochemistry , oceanography , geology , biology , engineering , genetics
ZnO thin films were deposited on glass, Si, SiO 2 and NiO substrates with radio frequency (RF) magnetron sputtering using a ZnO target. ZnO films on glass and SiO 2 substrates were relatively smooth and dense with similar surface morphology, while Si gave porous films, and the porosity increased with increasing film thickness. XRD analysis suggested that the ZnO films on Si, SiO 2 and glass were highly oriented along the c ‐axis. Films on glass and SiO 2 had lower compressive internal stress than those on Si. The results of Hall effect measurements indicated that the conductivity of ZnO films on Si, SiO 2 and glass increased with increasing film thickness. However, the changes of carrier concentration and mobility with film thickness are different for the different substrates. XPS showed that the Zn to O ratio on Si is higher than those on SiO 2 and glass. The mechanism of the substrate effect is then briefly discussed on the basis of the experimental results. Copyright © 2007 Curtin University of Technology and John Wiley & Sons, Ltd.