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A Study of the Rapid Thermal Annealing Process for PECVD‐Deposited Borophosphosilicate Glass
Author(s) -
Naimpally A.
Publication year - 1997
Publication title -
developments in chemical engineering and mineral processing
Language(s) - English
Resource type - Journals
eISSN - 1932-2143
pISSN - 0969-1855
DOI - 10.1002/apj.5500050309
Subject(s) - plasma enhanced chemical vapor deposition , annealing (glass) , thermal , boron , materials science , composite material , chemical vapor deposition , optoelectronics , chemistry , thermodynamics , physics , organic chemistry
A study of the flow behavior of PECVD‐deposited borophosphosilicate glass has been conducted The flow that occurs due to the rapid thermal annealing process was measured for several concentrations of boron and phosphorus, as well as for different heights of the glass. The flow angle increases with the concentrations of boron and phosphorus, and increases in the height of the glass. The results will prove useful to process engineers trying to achieve flow with low thermal loads using rapid thermal annealing.