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Novel high porosity mesoporous silica using new mixed two‐block copolymers as a template
Author(s) -
Semsarzadeh Mohammad Ali,
Fardi Milad,
Khalilian Hamed,
Amiri Sahar
Publication year - 2013
Publication title -
asia‐pacific journal of chemical engineering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.348
H-Index - 35
eISSN - 1932-2143
pISSN - 1932-2135
DOI - 10.1002/apj.1723
Subject(s) - propylene oxide , materials science , tetraethyl orthosilicate , copolymer , mesoporous material , ethylene oxide , chemical engineering , mesoporous silica , mesoporous organosilica , polymerization , polymer chemistry , catalysis , chemistry , organic chemistry , nanotechnology , composite material , polymer , engineering
ABSTRACT Mixed block copolymers have been used as a template in the synthesis of new mesoporous silica particles, prepared from sol–gel method. The prominent effect of the block copolymers have been used to provide a new template that controls the surface area and porosity of the particles. Tetraethyl orthosilicate as silica source and two block copolymers, poly(propylene oxide)‐b‐poly(ethylene oxide)‐b‐poly(propylene oxide) and poly(ethylene oxide)‐ b ‐poly(propylene oxide)‐ b ‐poly(ethylene oxide) (Pluronics) as a surfactant, were used in water/ n ‐octane co‐solvent with citric acid catalyst to prepare new nanostructures of mesoporous silica (SPB 1 and SPB 1,2 ). The displacement of ethanol with cyclohexanol as a co‐surfactant drastically changed the surface properties of the new mesoporous silica particles (SPB 1,2 ). The surface area, porosity, morphology, and microstructure of particles were characterized by X‐ray diffraction, nitrogen adsorption–desorption, scanning electron microscopy), and transmission electron microscopy. The prepared particles have been specifically characterized for specific use and applications as supporting catalysts for the polymerization of vinyl acetate, drugs delivery, and in the membranes manufacturing based on polyurethanes. © 2013 Curtin University of Technology and John Wiley & Sons, Ltd.