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The structure of very thin gold layers produced by metalorganic chemical vapour deposition
Author(s) -
Allen D. W.,
Haigh J.
Publication year - 1995
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/aoc.590090112
Subject(s) - chemistry , chemical vapor deposition , metalorganic vapour phase epitaxy , layer (electronics) , deposition (geology) , impurity , thin film , chemical engineering , nanotechnology , organic chemistry , epitaxy , materials science , paleontology , sediment , engineering , biology
Gold layers have been deposited from methyl(triethylphosphine)gold(I) by metalorganic chemical vapour deposition (MOCVD) and their structure and composition examined. At two deposition temperatures the layers have an underlying structure which is fine‐grained in the case of the 500°C layer and therefore of interest for thin‐layer device structures. Impurity levels are low in this layer.