Premium
Photodissociation of multilayered trimethylaluminum adsorbed on a cryogenic substrate: A time‐of‐flight mass‐spectrometric study
Author(s) -
Kobayashi Makoto,
Sato Akihiko,
Tanaka Yugo,
Shinohara Hisanori,
Sato Hiroyasu
Publication year - 1993
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/aoc.590070503
Subject(s) - chemistry , photodissociation , substrate (aquarium) , mass spectrometry , adsorption , time of flight , time of flight mass spectrometry , analytical chemistry (journal) , molecule , ionization , photochemistry , chromatography , organic chemistry , ion , oceanography , geology
Photodissociation of trimethylaluminum [Al(CH 3 ) 3 ] adsorbed on a silica (SiO 2 ) substrate at 110 K has been studied by multiphoton ionization time‐of‐flight mass spectrometry. Translational energy distributions of aluminum and AlCH 3 fragments can be fitted with a composition of two Maxwell–Boltzmann distributions. The two components are attributed to different environments of photodissociating parent molecules in the multilayer.