Photodissociation of multilayered trimethylaluminum adsorbed on a cryogenic substrate: A time‐of‐flight mass‐spectrometric study | Zendy

Kobayashi Makoto | Zendy; Sato Akihiko | Zendy; Tanaka Yugo | Zendy; Shinohara Hisanori | Zendy; Sato Hiroyasu | Zendy

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Photodissociation of multilayered trimethylaluminum adsorbed on a cryogenic substrate: A time‐of‐flight mass‐spectrometric study

Author(s) -

Kobayashi Makoto,

Sato Akihiko,

Tanaka Yugo,

Shinohara Hisanori,

Sato Hiroyasu

Publication year - 1993

Publication title -

applied organometallic chemistry

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.53

H-Index - 71

eISSN - 1099-0739

pISSN - 0268-2605

DOI - 10.1002/aoc.590070503

Subject(s) - chemistry , photodissociation , substrate (aquarium) , mass spectrometry , adsorption , time of flight , time of flight mass spectrometry , analytical chemistry (journal) , molecule , ionization , photochemistry , chromatography , organic chemistry , ion , oceanography , geology

Photodissociation of trimethylaluminum [Al(CH 3 ) 3 ] adsorbed on a silica (SiO 2 ) substrate at 110 K has been studied by multiphoton ionization time‐of‐flight mass spectrometry. Translational energy distributions of aluminum and AlCH 3 fragments can be fitted with a composition of two Maxwell–Boltzmann distributions. The two components are attributed to different environments of photodissociating parent molecules in the multilayer.

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