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From cyclotetrasilazane [(CH 3 ) 2 SiNH] 4 via crystalline silicon nitride imide Si 2 N 2 NH to α‐Si 3 N 4
Author(s) -
Schaible Sabine,
Riedel Ralf,
Werner Elisabeth,
Klingebiel Uwe
Publication year - 1993
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/aoc.590070106
Subject(s) - imide , chemistry , thermal decomposition , silicon nitride , ammonia , nitride , silicon , nitrogen , inorganic chemistry , decomposition , analytical chemistry (journal) , crystallography , mineralogy , nuclear chemistry , polymer chemistry , organic chemistry , layer (electronics)
α‐Si 3 N 4 is synthesized by an ammonia thermal synthesis using a cyclic oligosilazane, [(CH 3 ) 2 SiNH] 4 , as the starting material. [(CH 3 ) 2 SiNH] 4 reacts in the presence of ammonia at 900°C and 80 MPa pressure to give silicon nitride imide (Si 2 N 2 NH). Subsequently, Si 2 N 2 NH is converted into α‐Si 3 N 4 by thermal decomposition at 1500°C and 0.1 MPa nitrogen with the simultaneous loss of NH 3 .
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