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Thin films of peroxopolytungstic acids: applications to optical waveguide components
Author(s) -
Itoh Kiminori,
Okamoto Tohru,
Wakita Shuhei,
Niikura Hiroshi,
Murabayashi Masayuki
Publication year - 1991
Publication title -
applied organometallic chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.53
H-Index - 71
eISSN - 1099-0739
pISSN - 0268-2605
DOI - 10.1002/aoc.590050413
Subject(s) - chemistry , waveguide , thin film , etching (microfabrication) , refractive index , thermal decomposition , carbon fibers , decomposition , optics , optoelectronics , organic chemistry , nanotechnology , materials science , composite material , layer (electronics) , composite number , physics
Thin films of peroxohetero(carbon)polytungstic acid (CW‐HPA) and carbon‐free isopolytungstic acid (W‐IPA) were prepared, and examined in terms of optical and etching properties. Thermal decomposition was found to give good results in removing excess hydrogen peroxide (H 2 O 2 ) during the preparation of CW‐HPA and W‐IPA. It was shown for the first time that thin films of CW‐HPA and W‐IPA have very high refractive indices (larger than 2.0) when sufficiently dried. Optical waveguide (OWG) characteristics of these films were examined using a slab‐type OWG structure and ARROW (Antiresonance Reflection Optical Waveguide)‐type structures. An embossing technique was applied to make diffractional grating couplers.